IJD enables transferring properties of 2D MoS2 to large area

A disruptive work by IMEM-CNR demonstrated a process to produce, by IJD, MoS2 thin films in the 200 nm range with 2D optoelectronic properties — an industrially viable process to manufacture large-area 2D-like materials.

The solution leverages the unique IJD ablation dynamics, resulting in an amorphous MoS2 matrix with ultra-thin crystalline MoS2 inclusions that let the film perform like a 2D layer despite being 200 nm thick. Published open-access in npj 2D Materials and Applications: doi.org/10.1038/s41699-021-00244-x